In May 2021 SCIL Nanoimprint Solutions moved to the High Tech Campus in Eindhoven. With this move SCIL expanded its lab and cleanroom space to 200 m2 with further expansion possibilities.
High accurate overlay alignment with FabSCIL module
SCIL Nanoimprint Solutions again shows its leadership in NIL by achieving highly accurate front-to-back overlay alignment on its unique 300mm SCIL imprint module. By combining the SCIL imprint method, inorganic imprint materials and optimized processing, structures can be created with unsurpassed dimensional and optical properties (R.I.>2.0). This opens many opportunities in smart glasses, 3D sensing and other nanophotonic applications.
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Presentation at EPIC meeting
Marc Verschuuren presented the latest on SCIL Nanoimprint Solutions at the EPIC meeting hosted by SUSS MicroOptics in Neuchatel, Switserland.