SCIL stands for ‘Substrate Conformal Imprinting Lithography’, a cost effective, robust, high yield process enabling nanometer resolution on a large variety of substrates. Satisfying the rapidly increasing demand for products with nano imprinted components, SCIL delivers proven, high quality imprints on large areas up to 200 mm. It can be used to make nano and micro patterns with feature sizes down to less than 10 nm. And because of the unique properties of the imprint resist, SCIL saves time by directly producing a hard-etch mask or functional layer.
Unlike conventional lithography processes, SCIL has fewer defects. Compared to other imprint lithography processes SCIL causes less damage to the materials thanks to its soft conformal stamp. Patterns are imprinted over particle contaminants and distortions are dissipated in the soft rubber layer. Improving yield, this results in lower operation cost and high quality output of your products.
SCIL combines the resolution and accuracy of rigid stamps with the flexibility of soft stamp methods. SCIL takes away all the drawbacks of rigid lithography, achieving nanometre resolution without the pattern deformation that other soft stamp methods suffer from. Benefits include:
- Large contact area
- No damage to stamp or substrate
- Low cost stamp with extended lifetime
- reduced cost of repeatedly making new stamps
- Multiple stamps from one master
- Lower flatness requirement of substrate
- Freedom of resist type
SCIL is capable of printing non-digital patterns, and can imprint on 2.5D surfaces. Furthermore, surfaces maintain uniform thickness after imprinting.