{"id":4689,"date":"2023-07-26T12:25:25","date_gmt":"2023-07-26T12:25:25","guid":{"rendered":"http:\/\/www.scil-nano.com\/Clone\/?page_id=4689"},"modified":"2024-04-01T09:40:23","modified_gmt":"2024-04-01T08:40:23","slug":"scil-application-center","status":"publish","type":"page","link":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/","title":{"rendered":"SCIL Application Center"},"content":{"rendered":"\n
<\/span>
<\/div>
\n

Our facilities<\/strong><\/h1>\n<\/div><\/div>\n\n\n\n

Our facilities<\/h2>\n\n\n

SCIL Nanoimprint solutions provides its customers with everything they need – consumables, tooling & support- to achieve high-resolution nano-patterns on different substrates. A dedicated team that facilitates the production of your nanoimprints and takes them to the next level.<\/p>\n\n\n

\n
\n
\"Efficient<\/figure><\/div>\n\n\n
<\/div>\n\n\n\n

Efficient<\/h3>\n\n\n\n

Maximizing efforts to deliver
high quality products<\/p>\n\n\n\n

<\/div>\n<\/div>\n\n\n\n
\n
\"Committed<\/figure><\/div>\n\n\n
<\/div>\n\n\n\n

Committed<\/h3>\n\n\n\n

Full dedication to helping our customers achieve optimal results<\/p>\n\n\n\n

<\/div>\n<\/div>\n\n\n\n
\n
\"Skilled<\/figure><\/div>\n\n\n
<\/div>\n\n\n\n

Skilled<\/h3>\n\n\n\n

Multidisciplinary talented team delivering solutions<\/p>\n\n\n\n

<\/div>\n<\/div>\n<\/div>\n\n\n

SCIL’s extensive process knowledge in both pre and post-processing is a result of decades of experience in the field of nano-processing. Consequently, this knowledge provides benefits and advantages to our customers from the early proof of concept phase to the final goal of high-volume manufacturing.\u00a0<\/p>\n\n\n

<\/div>
\n
\n

The SCIL application center, operating from The High Tech Campus in Eindhoven (The Netherlands), is equipped with everything you need to make collaboration with customers a great success. Moreover, in our application center, we have a multitude of analytical tools including (but not limited to) a high-resolution SEM and a state-of-the-art metrology tool by our partners from TeraNova<\/a>. Therefore, you will have everything you need to characterize your high-resolution nano-patterns.<\/p>\n<\/div>\n\n\n\n

\n
\"worker<\/figure><\/div><\/div>\n<\/div><\/div>\n\n\n\n

<\/p>\n\n\n\n

Pilot production<\/h2>\n\n\n

After completing the proof of concept phase, SCIL Nanoimprint solutions offers customers the possibility of pilot production at our facilities in Eindhoven. Using our patented resist and stamp combination<\/a> up to 500 imprints can be done with just a single stamp without compromising structure fidelity. In addition, resists with a wide range of refractive indices, i.e. 1.25 – \u00a02.0 in the visible spectrum, are available at SCIL for meeting the needs of a variety of customer applications.<\/p>\n\n\n

<\/div>\n\n\n\n
\n
\n
\"Imprint<\/figure><\/div>\n\n\n

x imprint wafers<\/p>\n<\/div>\n\n\n\n

\n
\"Alignment<\/figure><\/div>\n\n\n

< 1 \u00b5m
Alignment accuracy<\/p>\n<\/div>\n\n\n\n

\n
\"wafer<\/figure><\/div>\n\n\n
<\/div>\n\n\n\n

100 to 300 mm
Wafer size<\/p>\n<\/div>\n<\/div>\n","protected":false},"excerpt":{"rendered":"

SCIL Nanoimprint solutions provides its customers with everything they need – consumables, tooling & support- to achieve high-resolution nano-patterns on different substrates. A dedicated team that facilitates the production of your nanoimprints and takes them to the next level. Efficient Maximizing efforts to deliver high quality products Committed Full dedication to helping our customers achieve… Read More »SCIL Application Center<\/span><\/a><\/p>\n","protected":false},"author":5,"featured_media":7559,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_eb_attr":"","neve_meta_sidebar":"","neve_meta_container":"","neve_meta_enable_content_width":"","neve_meta_content_width":0,"neve_meta_title_alignment":"","neve_meta_author_avatar":"","neve_post_elements_order":"","neve_meta_disable_header":"","neve_meta_disable_footer":"","neve_meta_disable_title":"","_themeisle_gutenberg_block_has_review":false,"footnotes":""},"class_list":["post-4689","page","type-page","status-publish","has-post-thumbnail","hentry"],"yoast_head":"\nSCIL Application Center - High-resolution nano-patterns<\/title>\n<meta name=\"description\" content=\"We offer a complete SCIL package for high-resolution nano-patterns, with a experienced team and extensive process knowledge.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"SCIL Application Center - High-resolution nano-patterns\" \/>\n<meta property=\"og:description\" content=\"We offer a complete SCIL package for high-resolution nano-patterns, with a experienced team and extensive process knowledge.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/\" \/>\n<meta property=\"og:site_name\" content=\"SCIL Nanoimprint Solutions\" \/>\n<meta property=\"article:modified_time\" content=\"2024-04-01T08:40:23+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2024\/03\/Picture1.png\" \/>\n\t<meta property=\"og:image:width\" content=\"554\" \/>\n\t<meta property=\"og:image:height\" content=\"490\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/png\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data1\" content=\"3 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/\",\"url\":\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/\",\"name\":\"SCIL Application Center - High-resolution nano-patterns\",\"isPartOf\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2024\/03\/Picture1.png\",\"datePublished\":\"2023-07-26T12:25:25+00:00\",\"dateModified\":\"2024-04-01T08:40:23+00:00\",\"description\":\"We offer a complete SCIL package for high-resolution nano-patterns, with a experienced team and extensive process knowledge.\",\"breadcrumb\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#breadcrumb\"},\"inLanguage\":\"en\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en\",\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#primaryimage\",\"url\":\"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2024\/03\/Picture1.png\",\"contentUrl\":\"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2024\/03\/Picture1.png\",\"width\":554,\"height\":490},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\/\/www.scil-nano.com\/Clone\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"SCIL Application Center\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/#website\",\"url\":\"https:\/\/www.scil-nano.com\/Clone\/\",\"name\":\"SCIL Nanoimprint Solutions\",\"description\":\"SCIL Nanoimprint Solutions\",\"publisher\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/#organization\"},\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/www.scil-nano.com\/Clone\/?s={search_term_string}\"},\"query-input\":{\"@type\":\"PropertyValueSpecification\",\"valueRequired\":true,\"valueName\":\"search_term_string\"}}],\"inLanguage\":\"en\"},{\"@type\":\"Organization\",\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/#organization\",\"name\":\"SCIL Nanoimprint Solutions\",\"url\":\"https:\/\/www.scil-nano.com\/Clone\/\",\"logo\":{\"@type\":\"ImageObject\",\"inLanguage\":\"en\",\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/#\/schema\/logo\/image\/\",\"url\":\"http:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2020\/10\/SCIL-Logo.png\",\"contentUrl\":\"http:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2020\/10\/SCIL-Logo.png\",\"width\":300,\"height\":132,\"caption\":\"SCIL Nanoimprint Solutions\"},\"image\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/#\/schema\/logo\/image\/\"},\"sameAs\":[\"https:\/\/www.linkedin.com\/company\/scil-nanoimprint\/\"]}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"SCIL Application Center - High-resolution nano-patterns","description":"We offer a complete SCIL package for high-resolution nano-patterns, with a experienced team and extensive process knowledge.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/","og_locale":"en_US","og_type":"article","og_title":"SCIL Application Center - High-resolution nano-patterns","og_description":"We offer a complete SCIL package for high-resolution nano-patterns, with a experienced team and extensive process knowledge.","og_url":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/","og_site_name":"SCIL Nanoimprint Solutions","article_modified_time":"2024-04-01T08:40:23+00:00","og_image":[{"width":554,"height":490,"url":"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2024\/03\/Picture1.png","type":"image\/png"}],"twitter_card":"summary_large_image","twitter_misc":{"Est. reading time":"3 minutes"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"WebPage","@id":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/","url":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/","name":"SCIL Application Center - High-resolution nano-patterns","isPartOf":{"@id":"https:\/\/www.scil-nano.com\/Clone\/#website"},"primaryImageOfPage":{"@id":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#primaryimage"},"image":{"@id":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#primaryimage"},"thumbnailUrl":"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2024\/03\/Picture1.png","datePublished":"2023-07-26T12:25:25+00:00","dateModified":"2024-04-01T08:40:23+00:00","description":"We offer a complete SCIL package for high-resolution nano-patterns, with a experienced team and extensive process knowledge.","breadcrumb":{"@id":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#breadcrumb"},"inLanguage":"en","potentialAction":[{"@type":"ReadAction","target":["https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/"]}]},{"@type":"ImageObject","inLanguage":"en","@id":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#primaryimage","url":"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2024\/03\/Picture1.png","contentUrl":"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2024\/03\/Picture1.png","width":554,"height":490},{"@type":"BreadcrumbList","@id":"https:\/\/www.scil-nano.com\/Clone\/scil-application-center\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/www.scil-nano.com\/Clone\/"},{"@type":"ListItem","position":2,"name":"SCIL Application Center"}]},{"@type":"WebSite","@id":"https:\/\/www.scil-nano.com\/Clone\/#website","url":"https:\/\/www.scil-nano.com\/Clone\/","name":"SCIL Nanoimprint Solutions","description":"SCIL Nanoimprint Solutions","publisher":{"@id":"https:\/\/www.scil-nano.com\/Clone\/#organization"},"potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/www.scil-nano.com\/Clone\/?s={search_term_string}"},"query-input":{"@type":"PropertyValueSpecification","valueRequired":true,"valueName":"search_term_string"}}],"inLanguage":"en"},{"@type":"Organization","@id":"https:\/\/www.scil-nano.com\/Clone\/#organization","name":"SCIL Nanoimprint Solutions","url":"https:\/\/www.scil-nano.com\/Clone\/","logo":{"@type":"ImageObject","inLanguage":"en","@id":"https:\/\/www.scil-nano.com\/Clone\/#\/schema\/logo\/image\/","url":"http:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2020\/10\/SCIL-Logo.png","contentUrl":"http:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2020\/10\/SCIL-Logo.png","width":300,"height":132,"caption":"SCIL Nanoimprint Solutions"},"image":{"@id":"https:\/\/www.scil-nano.com\/Clone\/#\/schema\/logo\/image\/"},"sameAs":["https:\/\/www.linkedin.com\/company\/scil-nanoimprint\/"]}]}},"_links":{"self":[{"href":"https:\/\/www.scil-nano.com\/Clone\/wp-json\/wp\/v2\/pages\/4689","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.scil-nano.com\/Clone\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.scil-nano.com\/Clone\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.scil-nano.com\/Clone\/wp-json\/wp\/v2\/users\/5"}],"replies":[{"embeddable":true,"href":"https:\/\/www.scil-nano.com\/Clone\/wp-json\/wp\/v2\/comments?post=4689"}],"version-history":[{"count":44,"href":"https:\/\/www.scil-nano.com\/Clone\/wp-json\/wp\/v2\/pages\/4689\/revisions"}],"predecessor-version":[{"id":7651,"href":"https:\/\/www.scil-nano.com\/Clone\/wp-json\/wp\/v2\/pages\/4689\/revisions\/7651"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.scil-nano.com\/Clone\/wp-json\/wp\/v2\/media\/7559"}],"wp:attachment":[{"href":"https:\/\/www.scil-nano.com\/Clone\/wp-json\/wp\/v2\/media?parent=4689"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}