{"id":1547,"date":"2023-05-10T11:39:33","date_gmt":"2023-05-10T11:39:33","guid":{"rendered":"http:\/\/www.scil-nano.com\/Clone\/?page_id=1547"},"modified":"2024-04-23T12:24:36","modified_gmt":"2024-04-23T11:24:36","slug":"technology","status":"publish","type":"page","link":"https:\/\/www.scil-nano.com\/Clone\/technology\/","title":{"rendered":"Technology"},"content":{"rendered":"\n<div class=\"wp-block-cover alignfull\" style=\"min-height:190px;aspect-ratio:unset;\"><span aria-hidden=\"true\" class=\"wp-block-cover__background has-background-dim\"><\/span><img loading=\"lazy\" decoding=\"async\" width=\"2560\" height=\"648\" class=\"wp-block-cover__image-background wp-image-2983\" alt=\"Wafer\" src=\"http:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-scaled.jpg\" data-object-fit=\"cover\" srcset=\"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-scaled.jpg 2560w, https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-300x76.jpg 300w, https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-1024x259.jpg 1024w, https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-768x194.jpg 768w, https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-1536x389.jpg 1536w, https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-2048x518.jpg 2048w\" sizes=\"auto, (max-width: 2560px) 100vw, 2560px\" \/><div class=\"wp-block-cover__inner-container is-layout-flow wp-block-cover-is-layout-flow\">\n<h1 class=\"wp-block-heading alignfull has-text-align-center has-nv-site-bg-color has-text-color\" style=\"font-size:46px\">How SCIL technology works<\/h1>\n<\/div><\/div>\n\n\n\n<section id=\"wp-block-themeisle-blocks-advanced-columns-335a2f03\" class=\"wp-block-themeisle-blocks-advanced-columns alignfull has-1-columns has-desktop-equal-layout has-tablet-equal-layout has-mobile-equal-layout has-vertical-flex-start\"><div class=\"wp-block-themeisle-blocks-advanced-columns-overlay\"><\/div><div class=\"innerblocks-wrap\">\n<div id=\"wp-block-themeisle-blocks-advanced-column-5d90343f\" class=\"wp-block-themeisle-blocks-advanced-column\">\n<section id=\"wp-block-themeisle-blocks-advanced-columns-b2ead1d6\" class=\"wp-block-themeisle-blocks-advanced-columns has-2-columns has-desktop-equal-layout has-tablet-equal-layout has-mobile-collapsedRows-layout has-vertical-center\"><div class=\"wp-block-themeisle-blocks-advanced-columns-overlay\"><\/div><div class=\"innerblocks-wrap\">\n<div id=\"wp-block-themeisle-blocks-advanced-column-7c705a1c\" class=\"wp-block-themeisle-blocks-advanced-column\">\n<div style=\"height:38px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<h3 id=\"wp-block-themeisle-blocks-advanced-heading-ed45b291\" class=\"wp-block-themeisle-blocks-advanced-heading wp-block-themeisle-blocks-advanced-heading-ed45b291\">Our technology<\/h3>\n\n\n\n<p class=\"has-medium-font-size\" style=\"text-align: justify;\">Our technologies for enabling SCIL include the stamp\u2019s top layer component of X-PDMS, which facilitates fine detail, low pressure imprinting. Low pressure and zero damage characteristics are further enhanced through a choice of patented sol-gel resists, applied by capillary action.<\/p>\n\n\n\n<div class=\"wp-block-buttons is-content-justification-center is-layout-flex wp-container-core-buttons-is-layout-16018d1d wp-block-buttons-is-layout-flex\">\n<div class=\"wp-block-button has-custom-width wp-block-button__width-50 has-custom-font-size is-style-secondary\" style=\"font-size:26px\"><a class=\"wp-block-button__link wp-element-button\" href=\"http:\/\/www.scil-nano.com\/Clone\/benefits\/\" style=\"padding-right:var(--wp--preset--spacing--20);padding-left:var(--wp--preset--spacing--20)\">BENEFITS<\/a><\/div>\n<\/div>\n\n\n\n<div style=\"height:11px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n<\/div>\n\n\n\n<div id=\"wp-block-themeisle-blocks-advanced-column-5f9a9ec0\" class=\"wp-block-themeisle-blocks-advanced-column\">\n<div style=\"height:47px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<figure class=\"wp-block-embed is-type-video is-provider-youtube wp-block-embed-youtube wp-embed-aspect-16-9 wp-has-aspect-ratio\"><div class=\"wp-block-embed__wrapper\">\n<div class=\"nv-iframe-embed\"><iframe loading=\"lazy\" title=\"SCIL processes\" width=\"1200\" height=\"675\" src=\"https:\/\/www.youtube.com\/embed\/IRKWadQnAYA?feature=oembed\" frameborder=\"0\" allow=\"accelerometer; autoplay; clipboard-write; encrypted-media; gyroscope; picture-in-picture; web-share\" referrerpolicy=\"strict-origin-when-cross-origin\" allowfullscreen><\/iframe><\/div>\n<\/div><\/figure>\n<\/div>\n<\/div><\/section>\n\n\n\n<section id=\"wp-block-themeisle-blocks-advanced-columns-8e7cc7ae\" class=\"wp-block-themeisle-blocks-advanced-columns has-1-columns has-desktop-equal-layout has-tablet-equal-layout has-mobile-collapsedRows-layout has-vertical-flex-start\"><div class=\"wp-block-themeisle-blocks-advanced-columns-overlay\"><\/div><div class=\"innerblocks-wrap\">\n<div id=\"wp-block-themeisle-blocks-advanced-column-3c67f726\" class=\"wp-block-themeisle-blocks-advanced-column\">\n<p><\/p>\n\n\n\n<h3 class=\"wp-block-heading has-text-align-center\" style=\"font-size:40px\">3-layer stamp<\/h3>\n\n\n\n<p class=\"has-medium-font-size\" style=\"text-align: justify;\">Nanometer resolution patterns are possible due to the tri-layer stamp construction. Our X-PDMS (polydimethylsiloxane) top layer, which carries the nano\/micro structure, is added to your chosen middle and bottom layers of soft PDMS and thin glass, respectively.<\/p>\n\n\n\n<p class=\"has-medium-font-size\" style=\"text-align: justify;\">In this way, the stamp achieves conformal (full wafer contact) imprinting at low pressure. It is flexible enough to follow substrate unevenness while being rigid enough to create nanostructures without deformation. The X-PDMS is also soft enough for peel removing during sequential low force stamp release.<\/p>\n<\/div>\n<\/div><\/section>\n\n\n\n<section id=\"wp-block-themeisle-blocks-advanced-columns-2e322412\" class=\"wp-block-themeisle-blocks-advanced-columns has-1-columns has-desktop-equal-layout has-tablet-equal-layout has-mobile-collapsedRows-layout has-vertical-flex-start\"><div class=\"wp-block-themeisle-blocks-advanced-columns-overlay\"><\/div><div class=\"innerblocks-wrap\">\n<div id=\"wp-block-themeisle-blocks-advanced-column-dacb6631\" class=\"wp-block-themeisle-blocks-advanced-column\">\n<h3 class=\"wp-block-heading has-text-align-center\" style=\"font-size:40px\">Imprint material<\/h3>\n\n\n\n<p class=\"has-medium-font-size\" style=\"text-align: justify;\">Our special patented inorganic sol-gel resist material is optically transparent, non-yellowing, low haze and UV and temperature stable. It can be used both as hard etch mask and as a functional layer.<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li class=\"has-medium-font-size\"><strong><span style=\"color: #007581;\">Good etch resistance:<\/span><\/strong>&nbsp;Directly patterned hard mask<\/li>\n\n\n\n<li class=\"has-medium-font-size\"><span style=\"color: #007581;\"><strong>Good thermal stability:<\/strong><\/span>&nbsp;Directly patterned functional layers<\/li>\n\n\n\n<li class=\"has-medium-font-size\"><strong><span style=\"color: #007581;\">Highly reproducible:<\/span><\/strong>&nbsp;high quality imprints for maximum wafer efficiency<\/li>\n\n\n\n<li class=\"has-medium-font-size\"><strong><span style=\"color: #007581;\">Extended stamp lifetime:<\/span><\/strong> when used in combination with our patented sol-gels, stamps last for more than 500 imprint cycles without degradation<\/li>\n<\/ul>\n<\/div>\n<\/div><\/section>\n<\/div>\n<\/div><\/section>\n\n\n\n<div style=\"height:73px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><\/p>\n","protected":false},"excerpt":{"rendered":"","protected":false},"author":5,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_eb_attr":"","neve_meta_sidebar":"","neve_meta_container":"","neve_meta_enable_content_width":"","neve_meta_content_width":0,"neve_meta_title_alignment":"","neve_meta_author_avatar":"","neve_post_elements_order":"","neve_meta_disable_header":"","neve_meta_disable_footer":"","neve_meta_disable_title":"","_themeisle_gutenberg_block_has_review":false,"footnotes":""},"class_list":["post-1547","page","type-page","status-publish","hentry"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v26.0 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>How SCIL technology works<\/title>\n<meta name=\"description\" content=\"SCIL is a cost effective, robust, high yield imprint process enabling high nanometer resolution patters on a large variety of materials\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.scil-nano.com\/Clone\/technology\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"How SCIL technology works\" \/>\n<meta property=\"og:description\" content=\"SCIL is a cost effective, robust, high yield imprint process enabling high nanometer resolution patters on a large variety of materials\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.scil-nano.com\/Clone\/technology\/\" \/>\n<meta property=\"og:site_name\" content=\"SCIL Nanoimprint Solutions\" \/>\n<meta property=\"article:modified_time\" content=\"2024-04-23T11:24:36+00:00\" \/>\n<meta property=\"og:image\" content=\"http:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-scaled.jpg\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data1\" content=\"2 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/technology\/\",\"url\":\"https:\/\/www.scil-nano.com\/Clone\/technology\/\",\"name\":\"How SCIL technology works\",\"isPartOf\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/technology\/#primaryimage\"},\"image\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/technology\/#primaryimage\"},\"thumbnailUrl\":\"http:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-scaled.jpg\",\"datePublished\":\"2023-05-10T11:39:33+00:00\",\"dateModified\":\"2024-04-23T11:24:36+00:00\",\"description\":\"SCIL is a cost effective, robust, high yield imprint process enabling high nanometer resolution patters on a large variety of materials\",\"breadcrumb\":{\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/technology\/#breadcrumb\"},\"inLanguage\":\"en\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\/\/www.scil-nano.com\/Clone\/technology\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"en\",\"@id\":\"https:\/\/www.scil-nano.com\/Clone\/technology\/#primaryimage\",\"url\":\"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-scaled.jpg\",\"contentUrl\":\"https:\/\/www.scil-nano.com\/Clone\/wp-content\/uploads\/2023\/06\/DSC_0242_1-scaled.jpg\",\"width\":2560,\"height\":648,\"caption\":\"SCIL Nanoimprint's technological possibilities. 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